Plating Laboratory Set

Realized approximately twice the agitation speed by 2-sided overflow type

■Features
The paddle agitation speed has been increased to a maximum of 130 rpm by changing the overflow from one side to two sides. The agitation efficiency of the liquid is increased, enabling more stable plating.

• Currently, this is a made-to-order product. Please contact us for sizes and specifications.
• Depending on the type and size of plating, we may suggest a 3-sided overflow.
• *Photograph shows a set of equipment with 1 side.

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Double-sided Wafer Plating Kit（A-52-STD)

Improved flow rate and velocity stabilize agitation

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Smart Cell 500G（A-56-0500G ）

No pumps or heaters required. Glass Smart Cell for high temperature and ionic liquids

■Features

Space-saving: The overflow circulation with a magnetic stirrer, without a pump, allows experiments even in a limited space.

Overflow agitation suppresses fluctuations in liquid surface height due to evaporation, etc., and maintains stable current distribution and plating area.

Heater is not required: The use of glass for the outer tank and fluoroplastic for the stirring mechanism enables heating using a hot stirrer.

The use of glass in the outer tank and fluororesin in the stirring mechanism allows for heating using a hot stirrer.

Easy to clean: The stirring mechanism inside the tank can be easily removed for cleaning.

Custom-made available: In addition to standard sizes, we can also produce tanks in other sizes and materials, such as SUS. Can be used for electroplating, electroless plating, and experiments with non-aqueous solvents.

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Candle Barrel（B-75DW)

Semi-rotational motion prevents deformation

This barrel rolls and mixes plated materials by a half-rotational motion in which the drum moves like a cradle without making a single rotation.

■Features

The half-rotating motion is expected to loosen the entanglement and suppress deformation of the plated material.

Mesh size can be changed by special order.

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Brush Tip Impregnant for SS-1（A-43-SS-1-P03）

Enables work on more detailed areas

The impregnating material for the plating solution when using the brush tool has been changed from the conventional degreasing cotton to a pen-nib tip. It is inserted into the white gold of the SS-1 brush tip.

■Features

The new brush tip is suitable for more detailed work because the plating solution is spread more evenly than with a cotton pad.

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Silicon Wafer Cathode Cartridge(Standard type/High current type) (A-52-STH2-P02)

■Features

・Suitable for wafers of general thickness. (200μm or more)
・Possible to set higher current density than usual such as high speed plating.
・Suitable for plating all surfaces and increasing the total current.
・Plating is also deposited on the contacts (surface contacts) of the electrode ring
・Necessary to peel off the contact plating film on a regular basis
※ Wafer size is designed according to JEITA and SEMI standards. We also manufacture square type.

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Hull Cell (for Hexavalent-Chromium-Use)MODEL-w Made of H-PVC (B-56W)

Heater can be attached to the hull cell for hexavalent chromium plating.
This is a hull cell exclusively for hexavalent chromium plating, whose temperature rises dramatically.
Hull cell with holes is fixed in a 1L square water tank.
A heater (B-58-WJB-Cr/B-58WB-Cr) with a thermal fuse can be mounted.

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